Photothermal Reflectance Investigation of Processed Silicon. I: Room Temperature Study of the Induced Damage and of the Annealing Kinetics of Defects in Ion Implanted Wafers

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C. Christofides, I.A. Vitkin and A. Mandelis, "Photothermal Reflectance Investigation of Processed Silicon. I: Room Temperature Study of the Induced Damage and of the Annealing Kinetics of Defects in Ion Implanted Wafers", J. Appl. Phys. 67 (6), 2815 - 2821, March, 1990

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