Study of the Induced Damage and of the Annealing Kinetics of Defects in Ion Implanted Silicon Using the Photothermal Reflectance Technique

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https://cadipt.mie.utoronto.ca/publications/study-of-the-induced-damage-and-of-the-annealing-kinetics-of-defects-in-ion-implanted-silicon-using-the-photothermal-reflectance-technique/

Citation

I.A. Vitkin, C. Christofides and A. Mandelis, "Study of the Induced Damage and of the Annealing Kinetics of Defects in Ion Implanted Silicon Using the Photothermal Reflectance Technique", Proc. 6th International Topical Meeting on Photoacoustic and Photothermal Phenomena, July 30 August 3, 1989; J. Murphy, J.W. MaclachlanSpicer, L.C. Aamodt and B.S.H. Royce, Eds., (SpringerVerlag, Berlin, 1990), pp. 153155.

Study of the Induced Damage and of the Annealing Kinetics of Defects in Ion Implanted Silicon Using the Photothermal Reflectance Technique

Permalink to Publication

https://cadipt.mie.utoronto.ca/publications/study-of-the-induced-damage-and-of-the-annealing-kinetics-of-defects-in-ion-implanted-silicon-using-the-photothermal-reflectance-technique/

Citation

I.A. Vitkin, C. Christofides and A. Mandelis, "Study of the Induced Damage and of the Annealing Kinetics of Defects in Ion Implanted Silicon Using the Photothermal Reflectance Technique", Proc. 6th International Topical Meeting on Photoacoustic and Photothermal Phenomena, July 30 - August 3, 1989; J. Murphy, J.W. Maclachlan-Spicer, L.C. Aamodt and B.S.H. Royce, Eds., (Springer-Verlag, Berlin, 1990), pp. 153-155.